尊敬的业内同仁，您好！

上海纳腾仪器有限公司诚挚地邀请您参加11月6日-8日在中国深圳·深圳坪山格兰云天国际酒店举办的第五届亚太碳化硅及相关材料国际会议。

在会议期间，上海纳腾仪器有限公司将在NO.131展台上展出最新产品和技术，我们诚挚地邀请您莅临展台，与我们进行深入的交流和探讨，共同探索合作与发展的可能性。

Distinguished delegates，

Shanghai NTI Co., Ltd. sincerely invite you to participate in the 5th Asia-Pacific Conference on Silicon Carbide and Related Materials (APCSCRM 2024)！

APCSCRM 2024 will be grandly held in Grand Skylight International Hotel Shenzhen Pingshan, China, on November 06-08, 2024, for better accelerating the academic research, technological progress and industrial upgrading of silicon carbide and other wide bandgap semiconductor industries in the Asia-Pacific region.

During the conference, Shanghai NTI Co., Ltd. will exhibit the latest products and technologies on booth NO.131. We sincerely invite you to visit our booth for in-depth exchanges and discussions, and explore the possibilities of cooperation and development together.

企业简介/Company profile

上海纳腾仪器有限公司致力于为微纳米科学领域提供相关设备与服务，公司拥有丰富的国内外各类品牌科学仪器和耗材代理经验，其中，代理的美国科磊（KLA Instruments）的纳米压痕仪、台阶仪、光学轮廓仪等一系列先进仪器，涵盖了微纳米领域的多个关键技术环节。公司是清华、北大、复旦、浙大、南大等知名高校及研究所的重要合作伙伴，也是美国科磊、新阳半导体等备受瞩目的企业单位的合格供应商

Shanghai NTI Co., Ltd. is committed to providing relevant equipment and services for the micro-nano science field. The company has rich experience in agency of various brand scientific instruments and consumables at home and abroad. Among them, a series of advanced instruments such as nanoindenters, step profilers, and optical profilometers of KLA Instruments（USA）cover multiple key technical links in the micro-nano field. The company is an important partner of well-known universities and research institutes such as Tsinghua University, Peking University, Fudan University, Zhejiang University, and Nanjing University. It is also a qualified supplier of high-profile enterprise units such as KLA Instruments and Shanghai Sinyang Semiconductor Materials Co., Ltd.

产品简介/About Production

1.Zeta光学轮廓仪

Zeta光学轮廓仪是一种非接触式 3D 表面形貌台式测量系统，该系统采用 ZDot™ 技术和多模光学器件，能够测量各种样品：透明和不透明、低至高反射率、光滑至粗糙纹理，以及从亚纳米到毫米的台阶高度。Zeta通过提供全面的台阶高度、粗糙度和薄膜厚度测量以及缺陷检测能力来支持研发和生产环境。

The Zeta optical profiler is a non-contact, 3D surface topography benchtop measurement system in a compact, robust package. The system is powered by ZDot™ technology and multi-mode optics, enabling measurement of a variety of samples: transparent and opaque, low to high reflectance, smooth to rough texture, and step heights from sub-nanometer to millimeters. The Zeta supports both R&D and production environments by providing comprehensive step height, roughness and film thickness measurements, plus defect inspection capability.

2.扫描电子显微镜

采用肖特基场发射电子枪（FEG）技术。先进的全柱加速技术集成到电子光学柱中，确保在低加速电压下具有出色的成像性能，实现各种材料的高分辨率成像。多探测器系统高效收集样品发出的各种电子信号进行成像，最大限度地揭示样品的微观形态和结构信息。

The scanning electron microscope(SEM) uses Schottky field emission electron gun (FEG) technology. Advanced full-column accelerating technology integrated into the electron optical column ensures outstanding imaging performance at low accelerating voltages, enables high-resolution imaging of various materials. Multiple detectors system collects diverse electron signals emitted from the sample efficiently for imaging, revealing microscopic morphology and structural information of the sample to the maximum extent.

3.Vista One光诱导力显微镜

在具备所有常规原子力显微镜功能的条件下，基于专利的光诱导力显微镜技术，结合波长可调的可见—红外光源，从而实现10nm以下空间分辨可见—红外场强成像与光谱采集，无需远场光学接收器及光谱仪。

Under the condition of having all the functions of conventional AFM, based on the patented light-induced force microscopy technology, combined with a wavelength-tunable visible-infrared light source, it can achieve spatially resolved visible-infrared field intensity imaging and spectral acquisition below 10nm, without the need for far-field optical receivers and spectrometers.

4.Filmetrics® R50系列

从半导体制造到实现可穿戴技术所需的柔性电子产品，对于任何利用导电膜的行业来说，片电阻监测都至关重要。R50的性能针对金属膜均匀性映射、离子掺杂和注入表征、膜厚度和电阻率映射以及非接触膜厚度测量进行了优化。

Sheet resistance monitoring is critical to any industry that utilizes conductive films, from semiconductor manufacturing to the flexible electronics required to enable wearable technology. The R50 capabilities are optimized for metal film uniformity mapping, ion doping and implant characterization, film thickness and resistivity mapping, and non-contact film thickness measurement.